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5N5 Electronic Grade Hydrogen Chloride

Category: Hydrogen Chloride

5N5 Electronic Grade Hydrogen Chloride

Main content ≥99.9995% Impurity gas content <1PPM Product grade 5N5 Mainly used in: integrated circuits in the epitaxial growth of pre-silicon, passivation, gallium arsenide high-temperature etching, gas-phase polishing, impurity absorption and clean processing, removal of sodium ions and other links.
Introduction

Electronic Grade Hydrogen Chloride

Main content ≥99.9995%

Impurity gas content <1PPM

Product grade 5N5

Mainly used in: integrated circuits in the epitaxial growth of pre-silicon, passivation, gallium arsenide high-temperature etching, gas-phase polishing, impurity absorption and clean processing, removal of sodium ions and other links.

Role of 5N5 Electronic Grade Hydrogen Chloride

5N5 Electronic Grade Hydrogen Chloride (5N5 purity, i.e. 99.999%) is a high-purity, low-impurity gas that is widely used in semiconductor, optoelectronics, photovoltaic, and carbide manufacturing. The following are its main roles:

1. Semiconductor manufacturing: Electronic grade HCl is mainly used for single crystal silicon wafer vapor phase polishing and epitaxial base corrosion in large-scale integrated circuit production, which can effectively remove impurities and defects on the surface of silicon wafers and enhance the performance of semiconductor devices.

2. Epitaxial growth pretreatment: In the semiconductor epitaxial growth process, electronic grade hydrogen chloride can be used for high temperature vapor phase etching to remove sodium ions and other impurities on the surface of silicon and gallium arsenide to ensure the high quality of the epitaxial layer.

3. metal surface treatment: the gas can be used for chemical treatment of metal surfaces, removing oxidized layers and other impurities, improving the cleanliness and reactivity of metal surfaces.

4. Cemented carbide manufacturing: In the production of cemented carbide, E-grade HCl is used to remove impurities and improve the microstructure of the material, thus enhancing the performance of the alloy.

5. Other applications: E-grade HCl is also used in laser gas mixtures, film production, carbon fiber surface treatment, etc. Its high purity and low impurity characteristics can meet the stringent requirements for gas quality in these high-tech fields.

Due to its strong corrosiveness and toxicity, electronic grade hydrogen chloride needs to be used and stored in strict compliance with safety regulations to ensure that the operating environment is dry and well ventilated.

5N5 Electronic Grade Hydrogen Chloride Product Technical Specification

Item/Component

 

   Content

Hydrogen chloride (HCl) purity (v/v)/10-2

99.9995

Oxygen + Argon (O2+Ar) content (volume fraction)/10-6

0.5

Nitrogen (N2) content (volume fraction)/10-6

1

Carbon dioxide (CO2) content (volume fraction)/10-6

0.5

Carbon monoxide (CO) content (volume fraction)/10-6

0.5

Hydrocarbon (CH4~C2H2) content (volume fraction)/10-6

1

Moisture (H2O) content (v/v) /10-6

0.5

Chlorine (Cl2) content (v/v)/10-6

0.5

Hydrogen(H2)content (volume fraction)/10-6

0.5


5N5 Electronic Grade Hydrogen Chloride Product Heavy Metal Impurity Technical Indexes


Heavy metal content/10-6(Mass Fraction)


 

Content

Aluminum (Al)

0.001

Srsenic (As)


0.001

Boron (B)


0.001

chromium (Cd)


0.001

Chromium (Cr)


0.001

Copper (Cu)


0.001

Iron (Fe)


0.003

Sodium (Na)


0.005

Nickel (Ni)


0.002

Phosphorus (P)


0.005

Lead (Pb)


0.002

Zinc (Zn)


0.005

Molybdenum (Mo)


0.01

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