Nitric acid is a very important reagent in the etching process of chip production, and trace chlorine ions mixed in the reagent will seriously affect the quality of semiconductor devices, therefore, different grades of nitric acid reagents, inorganic ions, especially chloride ions, sulfate and so on, have strict limit requirements. At present, for the electronic grade nitric acid group standard “high purity nitric acid for electronic industry” and “high purity nitric acid for electronic industry in the determination of trace anions Ion Chromatography” has completed the collection of opinions, the above standards are used in ion chromatography to detect trace anions in the nitric acid, ion chromatography in the assurance of the quality of electronic grade nitric acid has an indispensable role.

Nitric acid is a strong oxidizing and corrosive acid. Nitric acid is soluble in water, and its solution is colorless and transparent at room temperature. Its different concentrations of aqueous solution of different properties, commercially available concentrated nitric acid is a constant boiling mixture, the mass fraction of 69.2% (about 16 mol / L), the mass fraction is large enough (commercially available concentration of 95% or more), known as fuming nitric acid. Nitric acid decomposes readily in the presence of light and should be stored in a brown bottle in a dark place protected from light, or in a frosted outer plastic bottle (not recommended), and contact with reducing agents is strictly prohibited. The chemical formula is HNO3, concentrated nitric acid mixed with concentrated hydrochloric acid at a volume ratio of 1:3 can be made into a strong corrosive aqua regia. The anhydride of nitric acid is nitrogen pentoxide (N2O5).